Research on the Process of Low Pressure Chemical Vapor Deposition of Silicon Nitride Film

LIU Zongfang, YOU Yihui, LEE Choonghyun

Technology of IoT&AI ›› 2024, Vol. 56 ›› Issue (1) : 81-84.

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PDF(1395 KB)
Technology of IoT&AI ›› 2024, Vol. 56 ›› Issue (1) : 81-84.

Research on the Process of Low Pressure Chemical Vapor Deposition of Silicon Nitride Film

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2024, 56(1): 81-84

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